Newly released APCVD System for Crystalline Solar Cell volume production to deposit nondoped SiO2 film for Hard Mask and Passivation or to deposit doped SiO2 film for solid diffusion source for high end crystalline solar cells.

Feature

• Developed continuous APCVD system technologies and experience over 40 years at semiconductor wafer process to Crystalline Solar Cell production.
• Higher Productivity □156mm Wafer >1300 pcs/hour, □125mm >2000pcs/hour
• Application: Hard Mask, Solid Diffusion Source, Passivation

Continuous APCVD system is traditionally for semiconductor and solar power cell process. AMAYA Co., Ltd provides APCVD System for SiH4 and TEOS Base NSG, PSG, BPSG film deposition in atmospheric pressure.

Feature

• Use trays to transfer substrates.
• SiC trays achieve lower metal contamination.
• Higher throughput
• Plasma damage free deposition
• Many installation record worldwide
  

Lineup

• A6300                  Small footprint and high throughput
• AMAX Series 　   Deposit up to 300mm wafers.
• ATO Series         Use TEOS for Deposition.

AMAYA provides single wafer APCVD system for SiH4 and TEOS base NSG, PSG, BPSG film deposition.

Feature

• Face down method for better gap fill performance.
• Reduce particles by N2 Purge function.
• Plasma Damage Free design by APCVD system.

Lineup

• A200Series 200mm and 300mm wafer deposition.

R&D CVD System is available by AMAYA Co., Ltd.

Feature

Customize configuration available for R&D and pilot production.

Lineup

• D301　Single Wafer CVD system for multiple application.
• D501　Multi Wafer SiH4O3 APCVD System
• D601　Single Wafer APCVD system

Doctor T system is unique MOCVD system with its patented high temp vaporizer system to vaporizes types of materials at higher temperature. The high temp vaporizer was co-developed by Yamagata University and WACOM R&D CORPORATION by challenging controlling very complicated vapor flow with sensitive liquid flow with sensitive temperature control. This system enables various type of existing and new thin film deposition that does not even exist in the market.

Feature

• Patented original clogging free vaporizer.
• Various types of MOCVD film is available.
• Enable filling narrow gap trench with conformal shape.

Lineup

• DOCTOR T 1Single/Twin Chamber MOCVD System

This is a Phtomask Automatic Cleaning System. In order to meet various requirements,2 models are manufactured.

These 2 models are common in basic ideas. In the 1st block, phtomasks are soaked in heated sulfuric acid in the sulfuric acid bath to be free from organic material on the surface. Here, the surfaces acquire hydrophilicity.
The 2nd block is for scrub cleaning process to eliminate particles of over 1.0μm. The 3rd block is the final cleaning process to remove sub-micron particles in the SC-1 megasonic bath. In the 4th block, IPA vapor dryer performs highly controlled particle-free drying.
Loader/unloader includes cassettes which hold phtomasks either at vertical position or at horizontal position. The loader/unloader transfers photomasks automatically to various processing baths.

Intended for inner/outer tubes and branching tubes
Of rotary system
Realization of uniform and stable cleaning
Adoption of double-door system for safety control
Operation with less solvent
Intended for TC, boat, torch, cooling fin, shutter and so on
The dependable quality causes a great demand

Intended for inner/outer tubes
Of rotary system
Realization of uniform and stable cleaning
Adoption of PVDF for better cleaning results
Intended for boat, cooling fin, shutter, and so on
The dependable quality causes a great demand

Wafer Transfer Machine for 2 Wafers Placed Back to Back
This system is full automatic wafer transfer machine with cassette to cassette transfer and back-to-back function included.

TRANS BOY-II
This is a 2-cassette robot of compact design.

Variable Pitch Wafer Transfer Machine (VP/CP)
When using our developed wafer transfer system, a group of 25 wafers can be transferred to a quartz or SiC boat with varying pitch, which greatly contributes to saving of time and labor, a dust-free environment and a higher yield rate.
This transfer system is made of metal and the drive section is designed with covers to be completely dust resistant. It also allows for an orientation flat aligner to be attached.

Notch-Wafer Transfer Machine
This semi-auto wafer transfer machine performs significant notch alignment of 25 pcs of 8” wafers and cassette-to-cassette transferring.

Characteristics

• Compact
• Easy to purification
• ESD effect to wafer / carrier
• Soft DRY against other method
• Affinity for water
• Less influence to human body
• Reusable for better condensation
• Applicable for reprocessing

Specifications

• Wafer size: 4”, 5”, 6”, 8” (12” on request)

Line up

• Stand alone manual type
• In-Line (to cleaner) type